Thin Film Coating System


Model: NVTS-400

It works with physical vapor decomposition (PVD) technique which is one of the most common ways of thin film manufacture. There are 3 different modes of the device which are Thermal evaporation, RF and DC sputtering. Via this system, multilayered thin film can be produced.  Metallic, oxide, carbide or nitride structures such as Si, Al, Ti, SiO, WO, BaF2, MgF2, TiO2, Si3N4, SiO2, TiN are obtained according to the demand of the researchers. The period of coating takes place under high vacuum in Ar, N2, O2 atmospheres.

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